TiO_2(110)上のSiO_2薄膜の非線形光学効果  [in Japanese] Nonlinear Optical Effect of the SiO_2 Film on TiO_2(110)  [in Japanese]

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Author(s)

    • 表 美紀 OMOTE Miki
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology
    • 水谷 五郎 MIZUTANI Goro
    • 北陸先端科学技術大学院大学材料科学研究科 School of Materials Science, Japan Advanced Institute of Science and Technology

Abstract

We have measured SH intensity from SiO<SUB>2</SUB>/TiO<SUB>2</SUB> (110) and TiO<SUB>2</SUB> (110) for the photon energy from 2 <I>hω</I> = 3.65 eV to 4.68 eV. We have found that the SH intensity from SiO<SUB>2</SUB>/TiO<SUB>2</SUB> (110) is several times higher than that from TiO<SUB>2</SUB> (110) probably due to a resonance of some electronic level at the SiO<SUB>2</SUB>/TiO<SUB>2</SUB> (110) interface.

Journal

  • Shinku

    Shinku 45(3), 285-288, 2002-03-20

    The Vacuum Society of Japan

References:  4

Codes

  • NII Article ID (NAID)
    10008203150
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6144704
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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