マグネトロンスパッタ法を用いたカーボンナノチューブの直径及び密度制御  [in Japanese] Control of Diameter and Density of the Carbon Nanotubes Fabricated on the Hydrofluoric Acid Treated Substrates by RF Magnetron Sputtering  [in Japanese]

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Author(s)

    • 辻 啓太 TSUJI Keita
    • 大阪大学工学研究科電子工学専攻 Department of Electronic Engineering, Graduate School of Engineering, Osaka University
    • 李 奎毅 LEE Kuei-Yi
    • 大阪大学工学研究科電子工学専攻 Department of Electronic Engineering, Graduate School of Engineering, Osaka University
    • 大倉 重治 OHKURA Shigeharu
    • 大阪大学工学研究科電子工学専攻 Department of Electronic Engineering, Graduate School of Engineering, Osaka University
    • 本多 信一 HONDA Shin-ichi
    • 大阪大学工学研究科電子工学専攻 Department of Electronic Engineering, Graduate School of Engineering, Osaka University
    • 平尾 孝 HIRAO Takashi
    • 大阪大学工学研究科電気工学専攻 Department of Electrical Engineering, Graduate School of Engineering, Osaka University
    • 尾浦 憲治郎 OURA Kenjiro
    • 大阪大学工学研究科電子工学専攻 Department of Electronic Engineering, Graduate School of Engineering, Osaka University

Abstract

We have succeeded in controlling density and diameter of the carbon nanotubes (CNTs) prepared by RF magnetron sputtering. The catalytic Ni particles on the substrates were prepared by dipping the Ni film on the substrates into hydlofluoric acid (HF). The density and diameter of the particles were changed with varying HF treatment times. There was correlation between the particle size and the nanotube diameter. The particles could be working as nucleation seeds of carbon nanotubes.

Journal

  • Shinku

    Shinku 45(3), 293-296, 2002-03-20

    The Vacuum Society of Japan

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Codes

  • NII Article ID (NAID)
    10008203163
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6144722
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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