Heガスを用いたBi_2Sr_2Ca_<n-1>Cu_nO_yスパッタ薄膜の組成制御  [in Japanese] Phase Control of Bi_2Sr_2Ca_<n-1>Cu_nO_y Sputtered Films using He Gas  [in Japanese]

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Author(s)

Abstract

We prepared Bi<SUB>2</SUB>Sr<SUB>2</SUB>Ca<SUB>n-1</SUB>Cu<SUB>n</SUB>O<SUB>y</SUB> (BSCCO) thin films by RF magnetron sputtering using a mixture of He + O<SUB>2</SUB> sputtering gas (He : O<SUB>2</SUB>= 4 : 1). As helium gas effectively generates active particles of O<SUB>2</SUB><SUP>+</SUP> and O<SUP>+</SUP> by the Penning ionization effect, the crystallinity of the films is expected to improve.<BR>The crystallinity and the composition of films were dependent on the composition of targets. When we prepared the Bi -2212 films using the targets of Bi : Sr : Ca : Cu = 2 : 2 : 1 : Z (Z = 1.0-3.0), the best crystallinity of the film was obtained using the target of Z = 2.0. Furthermore, we prepared the Bi-2223 films with the composition of target, Bi : Sr : Ca : Cu = 2 : 2 : 2 : 3. The films with dominant Bi-2223 single phase were obtained only at <I>T<SUB>sub</SUB></I> = 630°C, but Bi-2223 and Bi-2212 mixed phases appeared at the other substrate temperatures.

Journal

  • Shinku

    Shinku 45(3), 297-300, 2002-03-20

    The Vacuum Society of Japan

References:  6

  • <no title>

    NAGAMATSU J.

    Nature 410, 63, 2001

    Cited by (76)

  • <no title>

    SCHOEN J. H.

    Science express, 2001

    Cited by (1)

  • <no title>

    HARADA K.

    Jpn. J. Appl. Phys. 35, 3590, 1996

    Cited by (10)

  • <no title>

    HARADA K.

    Jpn. J. Appl. Phys. 35, 4297, 1996

    Cited by (8)

  • <no title>

    AKIMITSU J.

    Jpn.J.Appl.Phys. 26, L2080, 1987

    Cited by (9)

  • <no title>

    MAEDA H.

    Jpn. J. Appl. Phys. 27, L209, 1988

    Cited by (52)

Codes

  • NII Article ID (NAID)
    10008203171
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6144735
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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