立体的マイクロマシニングのためのレジストスプレーコーティング Spray coating of photoresist for three dimensional micromachining

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New technique using spray coating of photoresist is developed for realizing the photolithography on samples having deep three dimensional structures. This technique is compatible with the highly developed planar photolithography and therefore promising for realizing the wide variety of micro-electro mechanical systems. The photoresist is sprayed as minute particles and carried to the sample surface. The particle dries individually without suffering the problem due to the resist flow or the surface tension (e.g., disconnection of film or accumulation of resist at corners). The appropriate drying condition realizes the thin and uniform resist film. The effects of some parameters which have the significant influence to the spray coating condition are examined. The thin and uniform photoresist film is reproducibly obtained on the deep three dimensional structure. The patterning is demonstrated using the conventional exposing equipment not only at the planar area but also corners or slant surfaces.

収録刊行物

  • 電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society

    電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society 122(5), 235-243, 2002-05-01

    一般社団法人 電気学会

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被引用文献:  4件中 1-4件 を表示

各種コード

  • NII論文ID(NAID)
    10008218870
  • NII書誌ID(NCID)
    AN1052634X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    13418939
  • NDL 記事登録ID
    6152580
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-B380
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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