大面積表面波プラズマによる高速・高選択液晶プロセスの研究  [in Japanese] High-Rate and High-Selectivity Liquid Crystal Display Process with A Large Size Surface Wave Plasma Source Using a Slot Antenna  [in Japanese]

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Author(s)

Abstract

A stable and uniform large-area plasma source for a 400 × 500 mm<SUP>2</SUP> size glass substrate using surface waves generated from a slot antenna has been developed. The width of the slot antenna was changed in five stages and two waveguides with two slot antennas were arranging in parallel. Ar plasma electron density of the order of 10<SUP>11</SUP> cm<SUP>-3</SUP> was investigated. As a result of process evaluation, a poly-Si etching rate of 470 nm/min and a SiNx etching rate of 770 nm/min were obtained. These values are approximately twofold to fivefold the corresponding values obtained by conventional chemical dry etching. The ashing rate of 1300 nm/min was sufficient for practical application. The selectivity to SiNx was 100 or more by the addition of CHF<SUB>3</SUB>gas. This is considered to be because the ammonium salt deposited on the SiNx surface formed a protective layer.

Journal

  • Shinku

    Shinku 45(4), 365-371, 2002-04-20

    The Vacuum Society of Japan

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Codes

  • NII Article ID (NAID)
    10008421894
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    05598516
  • NDL Article ID
    6169151
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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