酢酸存在下におけるアゾキシベンゼン類の光反応  [in Japanese] Photochemical Reaction of Azoxybenzenes in the Presence of Acetic Acid  [in Japanese]

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Author(s)

    • 濱田 龍二 HAMADA Ryuji
    • 鳥取大学工学部物質工学科 Department of Materials Science, Faculty of Engineering, Tottori University
    • 坪井 隆 TSUBOI Takasi
    • 鳥取大学工学部物質工学科 Department of Materials Science, Faculty of Engineering, Tottori University

Journal

  • Journal of the Chemical Society of Japan,chemistry and industrial chemistry

    Journal of the Chemical Society of Japan,chemistry and industrial chemistry 2002(3), 339-343, 2002-03-10

    日本化学会

References:  19

Codes

  • NII Article ID (NAID)
    10008439425
  • NII NACSIS-CAT ID (NCID)
    AN00186595
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    03694577
  • NDL Article ID
    6155476
  • NDL Source Classification
    ZP1(科学技術--化学・化学工業)
  • NDL Call No.
    Z17-659
  • Data Source
    CJP  NDL 
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