Comparison between DUV/VUV and Femtosecond Laser Processing of Dielectrics and Semiconductors.

  • SUGIOKA Koji
    RIKEN — The Institute of Physical and Chemical Research

Bibliographic Information

Other Title
  • 誘電体及び半導体のDUV/VUVレーザー加工とフェムト秒レーザー加工の比較
  • レーザー解説 誘電体及び半導体のDUV/VUVレーザー加工とフュムト秒レーザー加工の比較
  • レーザー カイセツ ユウデンタイ オヨビ ハンドウタイ ノ DUV VUV レーザー カコウ ト フュムトビョウ レーザー カコウ ノ ヒカク

Search this article

Abstract

Both of DUV/VUV and femtosecond lasers are expected as novel tools for materials processing for the next generation. DUV/VUV laser is good at surface micropatterning and surface shaping, while femtosecond laser is suitable for internal modification of transparent materials as well as micro-hole drilling, cutting and high aspect ratio machining. In this paper, precison microfabrication of dielectrics and semiconductors using DUV/VUV and femtosecond lasers are reviewed, and features of each laser processing are compared.

Journal

Citations (2)*help

See more

References(54)*help

See more

Details

Report a problem

Back to top