フェムト秒超加工による透明誘電体材料の機能化  [in Japanese] Functionalization of Transparent Dielectric Materials by Femtosecond Fabrication with Super-Resolution  [in Japanese]

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Author(s)

    • 三澤 弘明 MISAWA Hiroaki
    • 徳島大学大学院工学研究科工コシステムエ学専攻 Department of Ecosystem Engineering Graduate School of Engineering, The University of Tokushima

Abstract

Functionalization of dielectric materials such as crystals, glasses (silica-related or polymers), and liquid polymerizable resins by femtosecond (100-500 fs) irradiation is summarized. The modification was carried out by employing tight focusing optics with numerical aperture typically NA > 0.6. This allows to produce 3D optical memory and photonic crystals (PhC) by implementing a principle of the focal spot scanning inside silica glass or polymerizable resin. PhCs can be also fabricated by encoding the 3D hologram in negative polymer photoresist. Optically modified regions of dielectric were found to respond sensitively to wet etching. The contrast in the etching rate is over 50, which makes it possible to fabricate 3D channels for microfluidics inside dielectrics.

Journal

  • The Review of Laser Engineering

    The Review of Laser Engineering 30(5), 239-243, 2002-05-15

    The Laser Society of Japan

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Cited by:  2

Codes

  • NII Article ID (NAID)
    10008508823
  • NII NACSIS-CAT ID (NCID)
    AN00255326
  • Text Lang
    JPN
  • Article Type
    Journal Article
  • ISSN
    03870200
  • NDL Article ID
    6168130
  • NDL Source Classification
    ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
  • NDL Call No.
    Z16-1040
  • Data Source
    CJP  CJPref  NDL  J-STAGE 
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