レーザーオリジナル Increasing the Refractive Index of a Germanosilicate Planar Waveguide by lrradiation with an Infrared U1trashort Pulse Laser (「フェムト秒レーザーによる無機材料の微細加工」解説小特集号) Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser

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Abstract

Reported here is the use of the focused beam of an infrared ultrashort pulse laser (150 femtoseconds pulse width, 200 kHz repetition rate, 800 nm wavelength, and 100 μm/s scanning speed) to increase the refractive index of a germanium-doped silica-glass planar waveguide. The increase obtained, <i>Δn</i>, itself increases in proportion to increases in the laser intensity of the surface irradiation, and it saturates to 1.6 ∼ 1.8 × 10<sup>-3</sup> at 2.2 TW/cm<sup>2</sup>, without producing any increase in insertion loss and birefringence. Further, no decay in the refractive index change is observed after annealing at 200 °C for 10 hours. Results show that ultrashort pulse lasers are more suitable than UV lasers as light sources for highly stable adjustment of the optical lengths of waveguide devices.

Journal

  • The Review of Laser Engineering

    The Review of Laser Engineering 30(5), 251-254, 2002-05-15

    The Laser Society of Japan

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Codes

  • NII Article ID (NAID)
    10008508872
  • NII NACSIS-CAT ID (NCID)
    AN00255326
  • Text Lang
    ENG
  • Article Type
    OTR
  • ISSN
    03870200
  • NDL Article ID
    6168256
  • NDL Source Classification
    ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
  • NDL Call No.
    Z16-1040
  • Data Source
    CJP  NDL  J-STAGE 
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