Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.

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  • レーザーオリジナル Increasing the Refractive Index of a Germanosilicate Planar Waveguide by lrradiation with an Infrared U1trashort Pulse Laser

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Abstract

Reported here is the use of the focused beam of an infrared ultrashort pulse laser (150 femtoseconds pulse width, 200 kHz repetition rate, 800 nm wavelength, and 100 μm/s scanning speed) to increase the refractive index of a germanium-doped silica-glass planar waveguide. The increase obtained, Δn, itself increases in proportion to increases in the laser intensity of the surface irradiation, and it saturates to 1.6 ∼ 1.8 × 10-3 at 2.2 TW/cm2, without producing any increase in insertion loss and birefringence. Further, no decay in the refractive index change is observed after annealing at 200 °C for 10 hours. Results show that ultrashort pulse lasers are more suitable than UV lasers as light sources for highly stable adjustment of the optical lengths of waveguide devices.

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