A practical study on semiconducting glaze for insulators(2nd report)
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- Suzuki Yoshihiro
- NGK Insulators, Ltd.
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- Imai Osamu
- NGK Insulators, Ltd.
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- Mori Shigeo
- NGK Insulators, Ltd.
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- Mizuno Yukio
- Nagoya Institute of Technology
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- Naito Katsuhiko
- Meijo University
Bibliographic Information
- Other Title
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- 全面導電釉がいしの釉薬に関する実用化研究(その2)
- ゼンメン ドウデンユウガイシ ノ ウワグスリ ニ カンスル ジツヨウカ ケンキュウ ソノ 2
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Abstract
The semiconducting glaze insulator shows excellent performance under contaminated conditions. Basic characteristics of the semiconducting glaze for mass-production were reported in the previous report. The 2nd report describes its long-term characteristics and study results on how to improve them. The semiconducting glaze insulator sometimes suffers from surface roughening for longterm use under voltage application, which is called electrolytic corrosion. From the test results, the electrolytic corrosion was considered due to small discharge around wetted contaminants on the surface and thermal stress caused by leakage current flowing into the glaze. In addition, it was confirmed that the electrolytic corrosion could be improved by increasing amount of metal oxides (SnO2 and Sb2O3) in the semiconducting glaze and by adding small amount of the other metal oxide (Nb2O5). The suspension insulators produced with the improved semiconducting glaze were subjected to the acceleration laboratory test. The test results showed good performance within permissible increase in impedance and no serious damage of the glaze. The laboratory test results were compared with the field test data and it was concluded that the said semiconducting glaze insulators could have sufficient lifetime.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 122 (6), 610-615, 2002
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204599990784
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- NII Article ID
- 10008510273
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 6174985
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed