ポリマー基板への酸化シリコン薄膜の光化学的低温形成  [in Japanese] Photochemical Approach to Low Temperature Deposition of Silicon Oxide Thin Film on Polymeric Substrate  [in Japanese]

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Author(s)

Journal

  • Journal of The Surface Finishing Society of Japan

    Journal of The Surface Finishing Society of Japan 53(6), 419-420, 2002-06-01

    The Surface Finishing Society of Japan

References:  6

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    MIRLEY C. L.

    Langmuir 11, 1049, 1995

    Cited by (2)

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    BRUNNER H.

    Langmuir 12, 1996

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    INOUE K.

    Jpn. J. Appl. Phys. 26, 805, 1987

    Cited by (3)

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    HOLLANDER A.

    Macromolecule 27, 1994

    Cited by (1)

  • <no title>

    SUGIMURA H.

    Langmuir 16, 885, 2000

    Cited by (21)

  • <no title>

    長田義仁

    プラズマ重合 237, 1986

    Cited by (1)

Codes

  • NII Article ID (NAID)
    10008556848
  • NII NACSIS-CAT ID (NCID)
    AN1005202X
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    09151869
  • Data Source
    CJP  J-STAGE 
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