シリカガラスの真空紫外域の透明性と真空紫外レーザーとの相互作用  [in Japanese] Vacuum-Ultraviolet Transparency of Silica Glass and its Interaction with Vacuum-Ultraviolet Lasers  [in Japanese]

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Author(s)

    • 梶原 浩一 KAJIHARA Koichi
    • 科学技術振興事業団ERATO透明電子活性プロジェクト Transparent ElectroActive Materials Project, ERATO, JST
    • 平野 正浩 HIRANO Masahiro
    • 科学技術振興事業団ERATO透明電子活性プロジェクト Transparent ElectroActive Materials Project, ERATO, JST
    • 細野 秀雄 HOSONO Hideo
    • 東京工業大学応用セラミックス研究所 Materials and Structures Laboratory, Tokyo Institute of Technology

Abstract

Silica glass is a promising optical material in the deep-ultraviolet (DUV, -4.1-6.2 eV or 300-200 nm) to vacuum-ultraviolet (VUV, >-6.2 eV or <-200 nm) region since its optical band gap is located at-8 eV. For such a purpose, it is crucial to control its band-edge transparency and optical resistivity against the intense laser radiation of DUV-VUV excimer lasers (KrF ; 5.0 eV or 248 nm, ArF ; 6.4 eV or 193 nm, F<SUB>2</SUB> ; 7.9 eV or 157 nm) . The present article reviews our recent studies on silica glasses irradiated with DUV-VUV excimer lasers, including several topics of the improvement of optical transparency by introducing Si-F terminals, the photostructural change of SiOH groups, the formation and annealing kinetics of laser-induced point-defects involving the role of hydrogen, and the application of F-doped glasses to DUV optical fibers.

Journal

  • Nihon Kessho Gakkaishi

    Nihon Kessho Gakkaishi 44(3), 182-188, 2002-06-28

    The Crystallographic Society of Japan

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  • Optical Properties and Structure of Defects in Silica Glass

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Codes

  • NII Article ID (NAID)
    10008687410
  • NII NACSIS-CAT ID (NCID)
    AN00188364
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    03694585
  • NDL Article ID
    6199841
  • NDL Source Classification
    ZM46(科学技術--地球科学--岩石・鉱物・鉱床)
  • NDL Call No.
    Z15-138
  • Data Source
    CJP  NDL  J-STAGE 
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