Plasma Etching of TEM Samples for Observing Grain Boundaries in Silicon Nitride

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Author(s)

Journal

  • Journal of Electron Microscopy

    Journal of Electron Microscopy 44(3), 159-164, 1995-06-01

    Published for the Japanese Society of Electron Microscopy by Oxford University Press

References:  14

Codes

  • NII Article ID (NAID)
    10008808777
  • NII NACSIS-CAT ID (NCID)
    AA00697060
  • Text Lang
    ENG
  • Article Type
    NOT
  • ISSN
    00220744
  • NDL Article ID
    3627859
  • NDL Source Classification
    PA43(無機化学・無機化学工業--非金属元素・非金属化合物)
  • NDL Source Classification
    ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
  • NDL Call No.
    Z53-T76
  • Data Source
    CJP  NDL 
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