シリコン系薄膜製膜技術の現状と展望  [in Japanese] Development of thin film deposition technique of amorphous and microcrystalline silicon  [in Japanese]

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Author(s)

    • 近藤 道雄 KONDO Michio
    • 産業技術総合研究所薄膜シリコン系太陽電池開発研究ラボ National Institute of Advanced Industrial Science and Technology
    • 藤原 裕之 FUJIWARA Hiroyuki
    • 産業技術総合研究所薄膜シリコン系太陽電池開発研究ラボ National Institute of Advanced Industrial Science and Technology
    • 松田 彰久 MATSUDA Akihisa
    • 産業技術総合研究所薄膜シリコン系太陽電池開発研究ラボ National Institute of Advanced Industrial Science and Technology

Journal

  • 應用物理

    應用物理 71(7), 823-832, 2002-07-10

    応用物理学会

References:  37

  • <no title>

    SPEAR E.

    Solid State Commun 17, 1193, 1975

    Cited by (1)

  • <no title>

    STAEBLER L.

    Appl. Phys. Lett. 31, 292, 1977

    Cited by (1)

  • <no title>

    小長井誠編

    薄膜太陽電池の基礎と応用, 2001

    Cited by (1)

  • <no title>

    RECH B.

    Appl. Phys. A69, 155, 1999

    Cited by (1)

  • <no title>

    TAKAGI T.

    Thin Solid Films 345, 75, 1999

    Cited by (6)

  • <no title>

    YANG J.

    Appl. Phys. Lett. 70, 2975, 1997

    Cited by (3)

  • <no title>

    YAMAMOTO K.

    Tech. Dig. 12th int. Photovoltaic Science and Engineering Conf., Jeju 547, 2001

    Cited by (1)

  • <no title>

    VEPREK S.

    Solid State Electron. 11, 683, 1968

    Cited by (6)

  • <no title>

    USUI S.

    J.Non-Cryst.Solids 34, 1, 1979

    Cited by (5)

  • <no title>

    MATSUDA A.

    Jpn.J.Appl.Phys. 19, L305, 1980

    Cited by (4)

  • <no title>

    MATSUMURA H.

    Jpn.J.Appl.Phys. 37, 3175, 1998

    Cited by (19)

  • <no title>

    LIEBERMAN M.

    Principles of Plasma Discharge and Material Processing, 1994

    Cited by (1)

  • <no title>

    FINGER F.

    Appl.Phys.Lett. 65, 2588, 1994

    Cited by (4)

  • <no title>

    OTOBE M.

    Jpn. J. Appl. Phys 31, 1948, 1992

    Cited by (2)

  • <no title>

    PERRIN J.

    Plasma Phys. 36, 3, 1996

    Cited by (1)

  • <no title>

    SHIRATANI M.

    Jpn.J.Appl.Phys. 38, 4542, 1999

    Cited by (2)

  • <no title>

    NAKAMURA N.

    Jpn. J. Appl. Phys. 28, 1762, 1989

    Cited by (16)

  • <no title>

    OHSAWA M.

    Jpn. J. Appl. Phys. 24, L838, 1985

    Cited by (10)

  • <no title>

    KESSELS W. M. M.

    Thin Solid Films 383, 154, 2001

    Cited by (1)

  • <no title>

    TAKAI M.

    Appl. Phys. Lett. 77, 2828, 2000

    Cited by (5)

  • <no title>

    KUMAR S.

    J.Appl.Phys. 60, 1542, 1986

    Cited by (2)

  • <no title>

    TSAI C. C.

    Mater. Res. Soc. Symp. Proc. 192, 475, 1990

    Cited by (2)

  • <no title>

    MATSUDA A.

    Mater. Res. Soc. Symp. Proc. 164, 3, 1989

    Cited by (1)

  • <no title>

    MATSUDA A.

    Thin Solid Films 337, 1, 1996

    Cited by (1)

  • <no title>

    AKASAKA T.

    Appl. Phys. Lett. 66, 3441, 1995

    Cited by (5)

  • <no title>

    近藤道雄

    応用物理 66, 1047, 1997

    Cited by (2)

  • <no title>

    ENDO K.

    Sol. Energy Mater. & Sol. Cells 66, 283, 2001

    Cited by (1)

  • <no title>

    MATSUDA A.

    Jpn.J.Appl.Phys. 22, L115, 1983

    Cited by (8)

  • <no title>

    SHINDOH W.

    J. Appl. Phys. 79, 2347, 1996

    Cited by (1)

  • <no title>

    GUO L.

    Jpn. J.Appl. Phys 37, L1116, 1998

    Cited by (6)

  • <no title>

    FUKAWA M.

    Sol. Energy Mater. & Sol. Cells 66, 217, 2001

    Cited by (2)

  • <no title>

    HAMASAKI T.

    Appl.Phys.Lett. 37, 1084, 1980

    DOI  Cited by (4)

  • <no title>

    TAKAI M.

    J.Non-Cryst.Solids 266-269, 90, 2000

    Cited by (10)

  • <no title>

    SINNIAH K.

    J. Chem. Phys. 92, 5700, 1990

    DOI  Cited by (9)

  • <no title>

    VEPREK S.

    J. Non-Cryst. Solids 137-138, 779, 1991

    DOI  Cited by (1)

  • <no title>

    SCHEIB M.

    J.Non-Cryst.Solids 198-200, 895, 1996

    DOI  Cited by (7)

  • <no title>

    KONDO M.

    J. Non-Cryst. Solids 266-269, 84, 2000

    DOI  Cited by (20)

Codes

  • NII Article ID (NAID)
    10008830453
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    03698009
  • NDL Article ID
    6210526
  • NDL Source Classification
    ZM17(科学技術--科学技術一般--力学・応用力学)
  • NDL Call No.
    Z15-243
  • Data Source
    CJP  NDL 
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