低誘電率媒体としてのアモルファス窒化炭素薄膜  [in Japanese] Amorphous carbon nitride films as low dielectric constant materials for ULSI  [in Japanese]

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Author(s)

Journal

  • 應用物理

    應用物理 71(7), 892-894, 2002-07-10

    応用物理学会

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Codes

  • NII Article ID (NAID)
    10008830656
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    NOT
  • ISSN
    03698009
  • NDL Article ID
    6210839
  • NDL Source Classification
    ZM17(科学技術--科学技術一般--力学・応用力学)
  • NDL Call No.
    Z15-243
  • Data Source
    CJP  NDL 
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