プラズマ CVD 準絶縁性アモルファスシリコン窒化膜の組成制御技術  [in Japanese] Composition control techniques of semiinsulating amorphous silicon nitride films deposited by plasma CVD  [in Japanese]

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Author(s)

Journal

  • 應用物理

    應用物理 71(7), 895-896, 2002-07-10

References:  8

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Codes

  • NII Article ID (NAID)
    10008830681
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    NOT
  • ISSN
    03698009
  • Data Source
    CJP 
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