真空装置用アルマイト処理 [in Japanese] Anodized Film for Vacuum Equipment [in Japanese]
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We developed new methods for anodizing aluminum surfaces of plasma process chambers, one in sulfuric acid, and another in oxalic acid, in order to reduce particulate generation. The anodized films show a lower density of cracks than conventionally anodized films even after exposing to high temperature. Therefore, they have a better performance of small number in particulate. Analysis by X-ray diffraction, scanning electron microscopy, infrared spectroscopy and electron probe microanalysis reveals that both films are amorphous and that a cracking mechanism depends on the electrolyte and anodizing process. It is also found that number of cracks and total amount of outgassing increase after sealing process.
Shinku 45(5), 438-442, 2002-05-20
The Vacuum Society of Japan