真空装置用アルマイト処理  [in Japanese] Anodized Film for Vacuum Equipment  [in Japanese]

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Author(s)

Abstract

We developed new methods for anodizing aluminum surfaces of plasma process chambers, one in sulfuric acid, and another in oxalic acid, in order to reduce particulate generation. The anodized films show a lower density of cracks than conventionally anodized films even after exposing to high temperature. Therefore, they have a better performance of small number in particulate. Analysis by X-ray diffraction, scanning electron microscopy, infrared spectroscopy and electron probe microanalysis reveals that both films are amorphous and that a cracking mechanism depends on the electrolyte and anodizing process. It is also found that number of cracks and total amount of outgassing increase after sealing process.

Journal

  • Shinku

    Shinku 45(5), 438-442, 2002-05-20

    The Vacuum Society of Japan

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Codes

  • NII Article ID (NAID)
    10008831049
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6193426
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
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