アルミニウム表面の窒化反応  [in Japanese] Nitridation of Aluminum Surface  [in Japanese]

Access this Article

Search this Article

Author(s)

    • 阿部 積 ABE Izumo
    • 東北大学多元物質科学研究所 Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
    • 楠 勲 KUSUNOKI Isao
    • 東北大学多元物質科学研究所 Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

Abstract

Aluminum surfaces were nitrided with a 500 eV nitrogen ion beam at 25°C or with an ammonia molecular beam at 400°C. The nitrided surfaces were studied in situ under ultrahigh vacuum by X-ray photoelectron spectroscopy (XPS), <I>ex situ</I> by scanning electron microscopy (SEM), atomic force microscopy (AFM) and cathode luminescence (CL). The evolutions of the Al 2p and N 1s XP spectra during the nitridation show the difference of the reaction mechanism, though the XP spectra obtained at the saturation in the up-take curve of nitrogen were alike. The nitrogen atoms of the N<SUP>+</SUP><SUB>2</SUB> ion beam can penetrate into the bulk of aluminum and form the nitride even at room temperature, while the ammonia molecules are adsorbed on the surface and react with aluminum atoms supplied from the surface and the bulk. In the SEM and AFM images, an island-like structure was observed on the surface nitrided with the NH<SUB>3</SUB> molecular beam. Moreover, a characteristic luminescence was observed from the sample nitrided with the molecular beam.

Journal

  • Shinku

    Shinku 45(5), 463-467, 2002-05-20

    The Vacuum Society of Japan

References:  15

  • <no title>

    STRITE S.

    J.Vac. Sci. Technol. B10, 1237, 1992

    Cited by (46)

  • <no title>

    ISHIHARA M.

    Vacuum 59, 649, 2000

    Cited by (1)

  • <no title>

    TAYLOR J. A.

    J. Chem. Phys. 15, 1735, 1981

    Cited by (1)

  • <no title>

    REIER T.

    Electrochimica Acta 43, 149, 1998

    Cited by (1)

  • <no title>

    KUSUNOKI I.

    Surf. Rev. Lett. 5, 81, 1998

    Cited by (1)

  • <no title>

    KUSUNOKI I.

    Surf. Sci. 380, 131, 1997

    Cited by (4)

  • <no title>

    COX G. A.

    J. Phys. Chem. Solids 28, 543, 1967

    Cited by (1)

  • <no title>

    YIM W. M.

    J.Appl.Phys. 44, 292, 1973

    Cited by (6)

  • <no title>

    PONCE F. A.

    Appl.Phys.Lett. 68, 57, 1996

    Cited by (8)

  • <no title>

    BRIGGS D.

    Practical surface analysis by Auger and x-ray photoelectron spectroscopy, 1983

    Cited by (21)

  • <no title>

    HULTMAN L.

    Vacuum 57, 1-30, 2000

    DOI  Cited by (4)

  • <no title>

    LIESKE N.

    J. Appl. Phys. 52(9), 5806, 1981

    DOI  Cited by (2)

  • <no title>

    KUSUNOKI I.

    J. Chem. Phys. 101, 8238, 1994

    DOI  Cited by (3)

  • <no title>

    LAN Y. C.

    J. Crystal Growth 207, 247, 1999

    DOI  Cited by (1)

  • <no title>

    KUSUNOKI I.

    J. Chem. Phys. 101, 8238, 1994

    DOI  Cited by (3)

Codes

  • NII Article ID (NAID)
    10008831119
  • NII NACSIS-CAT ID (NCID)
    AN00119871
  • Text Lang
    JPN
  • Article Type
    SHO
  • ISSN
    05598516
  • NDL Article ID
    6193475
  • NDL Source Classification
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL Call No.
    Z16-474
  • Data Source
    CJP  NDL  J-STAGE 
Page Top