アルミニウム表面の窒化反応 [in Japanese] Nitridation of Aluminum Surface [in Japanese]
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Aluminum surfaces were nitrided with a 500 eV nitrogen ion beam at 25°C or with an ammonia molecular beam at 400°C. The nitrided surfaces were studied in situ under ultrahigh vacuum by X-ray photoelectron spectroscopy (XPS), <I>ex situ</I> by scanning electron microscopy (SEM), atomic force microscopy (AFM) and cathode luminescence (CL). The evolutions of the Al 2p and N 1s XP spectra during the nitridation show the difference of the reaction mechanism, though the XP spectra obtained at the saturation in the up-take curve of nitrogen were alike. The nitrogen atoms of the N<SUP>+</SUP><SUB>2</SUB> ion beam can penetrate into the bulk of aluminum and form the nitride even at room temperature, while the ammonia molecules are adsorbed on the surface and react with aluminum atoms supplied from the surface and the bulk. In the SEM and AFM images, an island-like structure was observed on the surface nitrided with the NH<SUB>3</SUB> molecular beam. Moreover, a characteristic luminescence was observed from the sample nitrided with the molecular beam.
Shinku 45(5), 463-467, 2002-05-20
The Vacuum Society of Japan