Tri-Phase Epitaxyによる高温超伝導,単結晶薄膜の作製  [in Japanese] Fabrication of HTSC Single Crystalline Thin Films by Tri-Phase Epitaxy  [in Japanese]

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Author(s)

    • 高橋 竜太 TAKAHASHI Ryota
    • 東京工業大学フロンティア創造共同研究センター Frontier Collaborative Research Center; Tokyo Institute of Technology
    • Yun K. S. KYUNG SUNG Yun
    • 東京工業大学フロンティア創造共同研究センター Frontier Collaborative Research Center; Tokyo Institute of Technology
    • 川崎 雅司 KAWASAKI M.
    • 東京工業大学総合理工学研究科物質科学創造専攻 Department of Innovative and Engineered Materials, Tokyo Institute of Technology ; Institute of Material Research, Tohoku University
    • 知京 豊裕 CHIKYOW Toyohiro
    • 物質・材料研究機構;COMET National Institute for Materials Science ; "Combinatorial Materials Exploration and Technology

Abstract

A high-Tc superconducting (HTSC) thin film with single crystal quality and atomically flat surface is a basic requirement for the fabrication of HTSC electronic devices. Despite extensive effort since the discovery of high-Tc superconductivity, this requirement has not been fully satisfied yet. Based on our experience on HTSC thin film growth, we proposed a novel fabricating method of single crystal RBa<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB>7−δ</SUB>(R=Y, Nd) thin films that are free from grain boundaries and have atomic scale surface smoothness. This method was devised in view of the thermodynamic phase diagram of RBa<SUB>2</SUB>Cu<SUB>3</SUB>O<SUB>7−δ</SUB> and the characteristics of vapor phase epitaxy (VPE). Since gas, liquid and solid phases are involved in this film growth, it is denoted Tri-Phase Epitaxy(TPE). Giant single crystal grains, verified by X-ray diffraction and transmission electron microscopy (TEM), should provide a big advantage for the use of these films in such applications as high frequency transmission lines and superconducting tunnel junctions.

Journal

  • Journal of the Japan Institute of Metals and Materials

    Journal of the Japan Institute of Metals and Materials 66(4), 284-288, 2002-04-20

    The Japan Institute of Metals and Materials

References:  16

Codes

  • NII Article ID (NAID)
    10008832481
  • NII NACSIS-CAT ID (NCID)
    AN00062446
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    00214876
  • NDL Article ID
    6151459
  • NDL Source Classification
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL Call No.
    Z17-314
  • Data Source
    CJP  NDL  J-STAGE 
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