DRAM 用誘電体Ba_xSr1_<1_x>TiO_3スパッタ膜の微細構造  [in Japanese] Microstructures of Dielectric Ba_xSr_<1_x>TiO3 Prepared by RF Sputtering  [in Japanese]

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Author(s)

Journal

  • Materia Japan

    Materia Japan 40(12), 1015, 2001-12-20

    The Japan Institute of Metals and Materials

References:  2

  • <no title>

    MIKAMI N.

    Thin Film Ferroelectric Materials and Devices 44, 1997

    Cited by (1)

  • <no title>

    KUROIWA T.

    Jpn. J. Appl. Phys. 33, 5187, 1994

    Cited by (16)

Codes

  • NII Article ID (NAID)
    10008847828
  • NII NACSIS-CAT ID (NCID)
    AN10433227
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    13402625
  • Data Source
    CJP  J-STAGE 
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