水素イオンのチャネリングによる微細コンタクトホール底の欠陥  [in Japanese] Defect at Bottom of a High Aspect-ratio Contact Hole Induced Proton Channeling  [in Japanese]

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Author(s)

Journal

  • Materia Japan

    Materia Japan 40(12), 1035, 2001-12-20

    The Japan Institute of Metals and Materials

References:  2

  • <no title>

    IKEGAMI N.

    Jpn.J.Appl.Phys. 36, 2470, 1997

    Cited by (7)

  • <no title>

    ICHIMORI T.

    Thin Solid Films 374, 228, 2000

    DOI  Cited by (2)

Codes

  • NII Article ID (NAID)
    10008847888
  • NII NACSIS-CAT ID (NCID)
    AN10433227
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    13402625
  • Data Source
    CJP  J-STAGE 
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