近接場光によるナノ領域堆積  [in Japanese] Nanometric area deposition by optical near-field.  [in Japanese]

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Author(s)

    • 李 謹炯 LEE Geun-Hyoung
    • 科学技術振興事業団, 創造科学技術推進事業, 大津局在フォトンプロジェクト Ohtsu localized photon project,ERATO, Japan Science and Technology Corp.
    • 山本 洋 YAMAMOTO Yoh
    • 東京工業大学大学院総合理工学研究科 Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology.
    • 興梠 元伸 KOUROGI Motonobu
    • 東京工業大学大学院総合理工学研究科 Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology.
    • 大津 元一 OHTSU Motoichi
    • 東京工業大学大学院総合理工学研究科 Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology.

Journal

  • 應用物理

    應用物理 69(10), 1222-1223, 2000-10-10

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Codes

  • NII Article ID (NAID)
    10008979276
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    NOT
  • ISSN
    03698009
  • Data Source
    CJP 
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