F_2レーザーの現状とリソグラフィー応用への展望  [in Japanese] Latest state of F_2 laser and application for microlithography  [in Japanese]

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Author(s)

Journal

  • 應用物理

    應用物理 70(2), 161-164, 2001-02-10

    応用物理学会

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Cited by:  3

  • Development of ultra line-narrowed F_2 laser system for microlithography  [in Japanese]

    NAKANO Masaki , NISHISAKA Toshihiro , WATANABE Hidenori , ARIGA Tatsuya , KITATOCHI Naoki , NOHDOMI Ryoichi , KUMAZAKI Takahito

    電気学会基礎・材料・共通部門大会講演論文集 = Proceeding of Annual Conference of Fundamentals and Materials Society, IEE Japan 2001, 235-240, 2001-09-21

    References (7)

  • Development of ultra line-narrowed F_2 laser system for microlithography  [in Japanese]

    NAKANO Masaki , WATANABE Hidenori , KITATOCHI Naoki , KUMAZAKI Takahito , NISHISAKA Toshihiro , ARIGA Tatsuya , NOHDOMI Ryoichi

    The Transactions of the Institute of Electrical Engineers of Japan. A 122(2), 205-210, 2002-02-01

    References (7)

  • Direct adsorption of ferritin to Si substrate  [in Japanese]

    KAWASHIMA Hiroyuki , HIKONO Takio , YAMADA Keisuke , URAOKA Yukiharu , YAMASHITA Ichiro , FUYUKI Takashi

    Technical report of IEICE. SDM 103(533), 93-98, 2003-12-12

    References (6)

Codes

  • NII Article ID (NAID)
    10008980484
  • NII NACSIS-CAT ID (NCID)
    AN00026679
  • Text Lang
    JPN
  • Article Type
    Journal Article
  • ISSN
    03698009
  • NDL Article ID
    5659969
  • NDL Source Classification
    ZM17(科学技術--科学技術一般--力学・応用力学)
  • NDL Call No.
    Z15-243
  • Data Source
    CJP  CJPref  NDL 
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