Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

• MORI Y.

収録刊行物

• Rev. Sci. Instrum.

  Rev. Sci. Instrum. 71 (8), 3173-, 2000

詳細情報

• CRID: 1573387449560696448
• NII論文ID: 10009266979
• データソース種別:
  • CiNii Articles