Growth of Carbon Nanostructure on a Graphite Substrate by Plasma-Enhanced Chemical Vapor Deposition

• KAWAKI Shunsuke

  Nano High-Tech Res. Center, Toyota Tech. Inst.

• MOON Won-Chul

  Nano High-Tech Res. Center, Toyota Tech. Inst.

• YOSHIMURA Masamichi

  Nano High-Tech Res. Center, Toyota Tech. Inst.

• UEDA Kazuyuki

  Nano High-Tech Res. Center, Toyota Tech. Inst.

Bibliographic Information

Other Title

• グラファイト基板上へのカーボンナノ構造の成長
• グラファイト キバン ジョウ エ ノ カーボンナノ コウゾウ ノ セイチョウ

Abstract

Cone-type carbon nanostructures (referred to as “nanotip”, hereafter) have been synthesized on a highly ordered pyrolytic graphite (HOPG) substrate by microwave plasma-enhanced chemical vapor deposition using methane (CH₄) and/or hydrogen (H₂) gas. The nanotips range from 100 to 500 nm in diameter and from 0.1 to 1 μm in height depending on growth conditions, and are grown normal to the surface. It should be noted that the nanotips grow without any catalysis and carbon source. We propose that hydrogen plasma etching plays a key role in the formation of the nanotips.

Journal

• Shinku

  Shinku 46 (5), 429-432, 2003

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390001204065542400
• NII Article ID: 10011610953
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.46.429
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 6615994
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6615994
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed