Lower Boundary of Supply Voltage in Digital ULSI Based on the Communication Theory
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- Nakase Hiroyuki
- Research Institute of Electrical Communication, Tohoku University
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- Sagitani Tsuyoshi
- Research Institute of Electrical Communication, Tohoku University
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- Masu Kazuya
- Research Institute of Electrical Communication, Tohoku University
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- Tsubouchi Kazuo
- Research Institute of Electrical Communication, Tohoku University
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抄録
We have proposed a theoretical design method for the lower boundary of supply voltage using the universal Eb⁄N0-bit error rate (BER) characteristics from the system viewpoint. In order to achieve the system error rate of less than 10−10 with the conditions of 10 years term, 10 GHz clock and 106 gate, the bit error rate of a gate should be less than 10−34. For a BER of 10−34, VDD should be larger than 0.1 V for 0.13 μm complementally metal-oxide-silicon (CMOS) LSI. For 0.05 μm CMOS of next generation, VDD should be larger than 0.2 V under the ideal thermal noise environment. The measured Eb⁄N0-BER characteristics of CMOS circuits as a function of supply voltage have agree well with the theoretical value.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 42 (10A), L1133-L1135, 2003
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681241267456
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- NII論文ID
- 10011766697
- 210000054670
- 130004530083
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- NII書誌ID
- AA11906093
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6705643
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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