Cross-Sectional Analysis of CuInS2 Thin Film Prepared from Electroplated Precursor
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- Onuma Yoshio
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd. Faculty of Engineering, Shinshu University
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- Takeuchi Kenji
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Ichikawa Sumihiro
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Suzuki Yasunari
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Fukasawa Ryo
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Matono Daisuke
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Nakamura Kenji
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Nakazawa Masao
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Takei Koji
- Core Technology Research Laboratory, Shinko Electric Industries Co., Ltd.
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- Hashimoto Yoshio
- Faculty of Engineering, Shinshu University
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- Ito Kentaro
- Faculty of Engineering, Shinshu University
Bibliographic Information
- Other Title
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- Cross-Sectional Analysis of CuInS<sub>2</sub>Thin Film Prepared from Electroplated Precursor
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Abstract
Thin CuInS2 films were prepared by sulfurization of Cu/In bi-layers. The precursor layer was firstly electroplated onto the treated surface of Mo-coated glass. The observation of the cross- section prepared by focused ion beam (FIB) etching revealed that the void-free film was initially formed on the top surface of the precursor and subsequently continued to grow until the advancing front of the film reached the Mo layer. Then followed the nucleation of voids near the bottom of the CuInS2 film. Prolonged sulfurization caused the voids to increase in size. Thin film solar cells were fabricated using the CuInS2 film as an optical absorber layer. It was found that the optimization of a sulfurization period is important in order to improve the cell efficiency.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 43 (1A/B), L108-L110, 2004
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681242712448
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- NII Article ID
- 10011950445
- 210000056918
- 130004531726
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- NII Book ID
- AA11906093
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 6834975
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed