Transmission Electron Microscopic Studies of LiNb_<0.5>Ta_<0.5>O_3 Films Deposited on Sapphire Substrates by Thermal Plasma Spray CVD (Microstructure of LiNb_<0.5>Ta_<0.5>O_3 Films Deposited by Thermal Plasma Spray CVD)

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Cross sections and plan views of LiNb<SUB>0.5</SUB>Ta<SUB>0.5</SUB>O<SUB>3</SUB> films were investigated mainly by high-resolution transmission electron microscopy. These films were deposited on (0001) sapphire substrates by thermal plasma spray chemical vapor deposition method at various feeding rates of liquid raw materials. It was found that the crystallinity and the preferential orientation of the LNT films depend on the feeding rate. The LNT film formed at the feeding rate of 7 mL/min was epitaxially grown on the substrate, and the orientation relationship between the film and the substrate was (0001)<SUB>LNT</SUB>⁄ ⁄(0001)<SUB>sapphire</SUB>, [11\\bar20]<SUB>LNT</SUB>⁄ ⁄[11\\bar20]<SUB>sapphire</SUB>. The LNT films fabricated at the higher and the lower feeding rate were polycrystalline. These films included twin crystals and other phases such as Li(Nb, Ta)<SUB>3</SUB>O<SUB>8</SUB>. The calculations based on the coincidence of reciprocal lattice points revealed that the epitaxial orientation relationships observed by transmission electron microscopy satisfied the geometrically optimal coherency across the interface.

収録刊行物

  • Materials transactions

    Materials transactions 43(7), 1517-1524, 2002-07-01

    公益社団法人 日本金属学会

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各種コード

  • NII論文ID(NAID)
    10012325021
  • NII書誌ID(NCID)
    AA1151294X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13459678
  • NDL 記事登録ID
    6240262
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z53-J286
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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