Preparation of a TiO<SUB>2</SUB> Film Coated Si Device for Photo-Decomposition of Water by CVD Method Using Ti(OPr<SUP>i</SUP>)<SUB>4</SUB>

• Sato Nobuaki

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Nakajima Kazuo

  Institute for Materials Research, Tohoku University

• Usami Noritaka

  Institute for Materials Research, Tohoku University

• Takahashi Hideyuki

  Institute for Materials Research, Tohoku University

• Muramatsu Atsushi

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Matsubara Eiichiro

  Institute for Materials Research, Tohoku University

Bibliographic Information

Other Title

• Preparation of a TiO2 Film Coated Si Device for Photo-Decomposition of Water by CVD Method Using Ti(OPri)4

Abstract

Growth of a TiO₂ film on a Si wafer by CVD method was studied for a new design of chemically stable device which is useful in the visible region and increases the efficiency of the photocatalytic decomposition process of water. This design is made up of a monolithic structure of a TiO₂ thin film and a Si solar cell. The TiO₂ film was deposited on a Si substrate by the vapor phase reaction of Ti(OPrⁱ)₄ with water at temperatures from room temperature to 473 K. At room temperature, a rough TiO₂ film with a nano-sized cone shape deposit was observed by AFM. The smooth TiO₂ film of ∼10 nm thickness was obtained by the reaction of 80 Pa Ti(OPrⁱ)₄ and 493 Pa water vapors at 473 K for 10.8 ks. The surface and the thickness of the film became rougher and thicker, respectively, with increasing pressure of Ti(OPrⁱ)₄.

Journal

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 43 (7), 1533-1536, 2002

  The Japan Institute of Metals and Materials

Keywords

• photo-decomposition of water
• silicon solar cell
• TiO<SUB>2</SUB> thin film
• chemical vapor deposition
• TiO<SUB>2</SUB>/Si heterostructure device
• photocatalysis
• titanium tetra-i-propoxide

Details

• CRID: 1390282679223908480
• NII Article ID: 130004451905
• NII Article ID: 10012325071
• NII Book ID: AA1151294X
• DOI: 10.2320/matertrans.43.1533
• COI: 1:CAS:528:DC%2BD38Xmt1eqtbo%3D
• ISSN: 13475320
• ISSN: 13459678
• NDL BIB ID: 6240318
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6240318
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/43/7/43_7_1533/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed