Hydrogen Enhancement of Interlayer Reaction in Ni/V Bilayer

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X-ray diffraction and Auger-electron spectroscopy depth profiling experiments clearly show that an interlayer reaction in a Ni/V bilayer forming Ni<SUB>3</SUB>V and Ni<SUB>2</SUB>V takes place at a temperature around 823 K when it is annealed in vacuum. However, this reaction temperature is reduced down to around 773 K when it is annealed in 0.5 MPa H<SUB>2</SUB>. A similar effect has also been observed for a Ni/Nb bilayer previously. These hydrogen-enhanced reactions in the two systems are interpreted to be due to formation of abundant vacancy-hydrogen complexes in the V and Nb layers, which efficiently assist the interdiffusion of the constituent atoms across the interfaces in the two bilayers.

収録刊行物

  • Materials transactions

    Materials transactions 43(11), 2692-2695, 2002-11-01

    公益社団法人 日本金属学会

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各種コード

  • NII論文ID(NAID)
    10012327781
  • NII書誌ID(NCID)
    AA1151294X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13459678
  • NDL 記事登録ID
    6366966
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z53-J286
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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