Pyroelectricity of Ferroelectric Vinylidene Fluoride-Oligomer-Evaporated Thin Films

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  • Noda Kei
    Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University
  • Ishida Kenji
    Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University
  • Horiuchi Toshihisa
    Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University
  • Yamada Hirofumi
    Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University
  • Matsushige Kazumi
    Department of Electronic Science and Engineering, Graduate School of Engineering, Kyoto University

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Abstract

The pyroelectricity of ferroelectric vinylidene fluoride (VDF)-oligomer [CF3(CH2CF2)17I]-evaporated film was investigated utilizing a low-frequency sinusoidal heat source. A current profile appeared as the summation of a fundamental sine wave with a frequency of the temperature change and its harmonic responses. The pyroelectric coefficient (p) of the 600-nm-thick VDF oligomer film was estimated to be −68 μC/m2K at 37°C, whose absolute value is larger than those reported for ferroelectric polymers. Various characteristics such as a large |p|, a small dielectric constant and suitability for preparation of thinner films suggest that the VDF oligomer is a promising material for application in pyroelectric thin-film infrared detectors.

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