FTIR-ATR Evaluation of Organic Contaminant Cleaning Methods for SiO2 Surfaces

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  • SHINOZAKI Akihito
    Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
  • ARIMA Kenta
    Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
  • MORITA Mizuho
    Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
  • KOJIMA Isao
    Materials Characterization Division, National Metrology Institute of Japan (NMIJ)
  • AZUMA Yasushi
    Materials Characterization Division, National Metrology Institute of Japan (NMIJ)

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The effectiveness of cleaning organic contaminants from silicon dioxide (SiO2) surfaces was studied by conducting highly sensitive measurements using Fourier Transform Infrared Attenuated Total reflectance (FTIR-ATR) with a Si prism as the waveguide. To serve as an example, the surface of the prism was oxidized to an order of a few nanometers. The oxidized Si surface film was allowed to stand in the atmosphere and then wet-cleaned in a repeated manner; subsequently its thickness was measured by ellipsometry. Although, various wet-cleaning methods were tested, they only showed values of 0.1 - 0.2 nm larger than, but not equal to, the original thickness immediately after oxidation. FTIR-ATR measurements of the spectral change after exposure to air revealed that organic species, such as C-CH3 and -(CH2)n-, increased with time. Wet-cleaning the sample failed to remove the C-CH3 species, which indicates that they corresponded to the film thickness increment from the original.

収録刊行物

  • Analytical Sciences

    Analytical Sciences 19 (11), 1557-1559, 2003

    社団法人 日本分析化学会

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