FTIR-ATR Evaluation of Organic Contaminant Cleaning Methods for SiO2 Surfaces
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- SHINOZAKI Akihito
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- ARIMA Kenta
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- MORITA Mizuho
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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- KOJIMA Isao
- Materials Characterization Division, National Metrology Institute of Japan (NMIJ)
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- AZUMA Yasushi
- Materials Characterization Division, National Metrology Institute of Japan (NMIJ)
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The effectiveness of cleaning organic contaminants from silicon dioxide (SiO2) surfaces was studied by conducting highly sensitive measurements using Fourier Transform Infrared Attenuated Total reflectance (FTIR-ATR) with a Si prism as the waveguide. To serve as an example, the surface of the prism was oxidized to an order of a few nanometers. The oxidized Si surface film was allowed to stand in the atmosphere and then wet-cleaned in a repeated manner; subsequently its thickness was measured by ellipsometry. Although, various wet-cleaning methods were tested, they only showed values of 0.1 - 0.2 nm larger than, but not equal to, the original thickness immediately after oxidation. FTIR-ATR measurements of the spectral change after exposure to air revealed that organic species, such as C-CH3 and -(CH2)n-, increased with time. Wet-cleaning the sample failed to remove the C-CH3 species, which indicates that they corresponded to the film thickness increment from the original.
収録刊行物
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- Analytical Sciences
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Analytical Sciences 19 (11), 1557-1559, 2003
社団法人 日本分析化学会
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詳細情報 詳細情報について
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- CRID
- 1390282679232615040
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- NII論文ID
- 10012534238
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- NII書誌ID
- AA10500785
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- COI
- 1:CAS:528:DC%2BD3sXptFGgurk%3D
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- ISSN
- 13482246
- 09106340
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- NDL書誌ID
- 6741569
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- PubMed
- 14640459
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- PubMed
- CiNii Articles
- KAKEN
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