Characteristics of TiO2 Thin Film as a Photocatalyst Prepared Using the Pulsed Laser Deposition Method

• SUDA Yoshiaki

  Sasebo National College of Technology

• KAWASAKI Hiroharu

  Sasebo National College of Technology

• OHSHIMA Tamiko

  Sasebo National College of Technology

• UEDA Tsuyoshi

  Sasebo National College of Technology

抄録

Titanium dioxide (TiO₂) thin films as a photocatalyst were prepared using the pulsed laser deposition (PLD) method. The structural and compositional properties of the films are described. Electron binding energy peaks of (a) Ti 2p3/2 and (b) O1s can be observed on films prepared by the PLD method. The crystallinity of the prepared TiO₂ film was measured by X-ray diffraction as a parameter of substrate temperature (Ts). XRD measurements revealed that the substrate temperature affected the phase formation, the crystalline structure and the preferred orientation of the TiO₂ films. The structure of the films as measured by an atomic force microscopy (AFM) suggests that the films prepared at Ts≤400°C are composed of particles of two sizes : small particles of ∼10 nm in diameter and large particles of ∼100 nm in diameter. The films prepared at Ts=600°C were composed entirely of large particles.

収録刊行物

• 表面技術

  表面技術 54 (11), 754-757, 2003

  一般社団法人 表面技術協会

キーワード

• TiO<SUB>2</SUB>
• Thin Film
• Photocatalyst
• Pulsed Laser Deposition
• XRD

詳細情報

• CRID: 1390001204117349120
• NII論文ID: 130000149597
• NII論文ID: 10012548885
• NII書誌ID: AN1005202X
• DOI: 10.4139/sfj.54.754
• ISSN: 18843409
• ISSN: 09151869
• NDL書誌ID: 6781456
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6781456
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可