Dependence on Vacuum Pressure for Tribological Properties of Ti, TiO<sub>2</sub> and TiN Thin Film

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  • Sasaki Michiko
    Department of Electrical Engineering, Kogakuin University, Advanced Materials Center, Kogakuin University
  • Nakamura Isao
    Advanced Materials Center, Kogakuin University
  • Takano Ichiro
    Department of Electrical Engineering, Kogakuin University, Advanced Materials Center, Kogakuin University
  • Sawada Yoshio
    Department of Electrical Engineering, Kogakuin University, Advanced Materials Center, Kogakuin University

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Other Title
  • Ti，TiO<sub>2</sub>およびTiN薄膜の摩擦·摩耗特性に対する雰囲気圧力依存性
  • Ti,TiO2およびTiN薄膜の摩擦・摩耗特性に対する雰囲気圧力依存性
  • Ti TiO2 オヨビ TiN ハクマク ノ マサツ マモウ トクセイ ニ タイスル フンイキ アツリョク イゾンセイ

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Abstract

Tribological properties of Ti-based (Ti, TiO2 and TiN) thin films on a stainless steel (304SS) substrate were investigated at several pressures in an atmosphere of the air. Films 0.2 µm thick were prepared on a mirror-polished substrate using each method of ion beam assisted deposition, ion beam assisted reactive deposition and dynamic ion beam mixing. The tribological test was carried out with a tribo meter of a pin-on-disk type in a high vacuum chamber. The wear surface was observed with a scanning laser microscope and a scanning electron microscope. The friction coefficient of stainless steel in a pressure of 1×105 Pa showed a lower value than that in 1×10-5 Pa, because oxygen or moisture contained in the air played a role of lubrication. Also the TiN thin film in 1×105 Pa showed a low friction coefficient until wearing the TiN layer on a substrate at a sliding distance of 10 m. However friction coefficients of the TiO2 and Ti thin film were hardly dependent on a gas pressure. In the case of 5 m in a sliding distance, friction coefficients of Ti-based thin films converged on 0.3 at a pressure of 1×10-3 Pa.

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