Cl2-based Inductively Coupled Plasma Etching of InP Using Internal Antenna

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著者

    • Matsutani Akihiro
    • Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
    • Ohtsuki Hideo
    • Samco International Inc., 36 Waraya-cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
    • Koyama Fumio
    • Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

抄録

We demonstrated the inductively coupled plasma (ICP) etching of InP using two-turn coil placed in process chamber as an internal antenna. It is found that the internal antenna well confines the plasma inside the coil. In addition, the result shows that the ion density in the internal antenna is higher than that in the external antenna at the same input power, and the etching rate with an internal antenna plasma of 100 W is almost the same as that with an external antenna plasma of 300 W. The ICP etching using the internal antenna will be an effective technique for high-speed etching and electric power saving.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 42(11), 6837-6838, 2003-11-15

    公益社団法人 応用物理学会

参考文献:  7件中 1-7件 を表示

  • <no title>

    MATSUTANI A.

    Jpn.J.Appl.Phys. 38, 4260, 1999

    被引用文献18件

  • <no title>

    MATSUTANI A.

    Jpn.J.Appl.Phys. 39, 1435, 2000

    被引用文献5件

  • <no title>

    SUGAI H.

    Jpn. J. Appl. Phys. 33, 2189, 1994

    被引用文献13件

  • <no title>

    KANOH M.

    Jpn. J. Appl. Phys. 40, 5419, 2001

    被引用文献2件

  • <no title>

    MATSUDA Y.

    The 20th Symp. on Plasma Processing, 2003, 2-8, 2003

    被引用文献1件

  • <no title>

    NAKAMURA K.

    The 20th Symp. on Plasma Processing, 2003, 2-14, 2003

    被引用文献1件

  • <no title>

    CICMAN P.

    Jpn. J. Appl. Phys. 41, 3114, 2002

    DOI 被引用文献2件

被引用文献:  1件中 1-1件 を表示

各種コード

  • NII論文ID(NAID)
    10012563882
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • データ提供元
    CJP書誌  CJP引用  J-STAGE  JSAP 
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