Thickness Dependence of Infrared Optical Properties of LaNiO3 Thin Films Prepared on Platinized Silicon Substrates

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著者

    • Hu Zhigao Hu Zhigao
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
    • Meng Xiangjian Meng Xiangjian
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
    • Huang Zhiming [他] Huang Zhiming
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
    • Wang Genshui
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
    • Zhao Qiang
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
    • Chu Junhao
    • National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China

抄録

Using infrared spectroscopic ellipsometry (IRSE), the infrared optical properties of LaNiO3 thin films with different film thicknesses on Pt/Ti/SiO2/Si substrates prepared by a modified metal-organic deposition technique have been investigated in the wavelength range of 2.5–12.6 μm. By fitting the measured ellipsometric parameter ($\Psi$ and $\Delta$) data with a three-phase model (Air/LaNiO3/Pt) and the classical Drude dispersion relation for the LaNiO3 thin films, the optical constants and thicknesses of the films have been obtained. The infrared optical constants (refractive index $n$ and extinction coefficient $\kappa$) of the LaNiO3 films decrease with increasing thickness in the measured wavelength range. It is closely associated with the crystallinity of the thin films, the crystalline size effect and the influence of the interface layer. An obvious break has been observed between the 49.2-nm thick film and the 70.2-nm thick film for the infrared optical constants. LaNiO3 has a relative large absorption coefficient and the absorption coefficient monotonously decreases with increasing thickness in the entirely measured wavelength range.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 42(11), 7045-7049, 2003-11-15

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10012564630
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    6752981
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  J-STAGE  JSAP 
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