Magnetron-sputtered Hydrogenated Carbon Nitride: Structural and Optical Properties of As-deposited and Postannealed Films

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Amorphous C:H:N thin films were deposited on n-Si and SiO2 substrates at 673 K by RF magnetron sputtering using pure graphite (99.999%) as a target material and mixtures of Ar, N2 and H2 for plasma generation. The dependence of structural and optical properties on nitrogen content was investigated using X-ray photoemission spectroscopy (XPS), Fourier transform infrared spectroscopy (FT-IR) spectroscopy, UV-visible absorption spectroscopy and ellipsometry. Typical stretching modes connected with carbon nitride and diamond-like carbon could be seen in FT-IR spectra. Ellipsometry studies revealed that the optical constants of refractive index ($n$) and extinction coefficient ($k$) increased with an increase in nitrogen content. The undesired increase in $k$ value due to increased nitrogen content is attributed to the formation of sp2CN bonds observed by XPS and FT-IR. Optimum conditions for producing transparent films with good values of $n$ and $k$ were determined. The films were subjected to thermal annealing at 873 K and 1073 K in vacuum (${\leq}1\times 10^{-5}$ Pa), and postannealing studies were carried out. Annealing caused breakage of undesired sp2CN bonds, which in turn enforced a good effect on the optical property of the films by increasing their optical transmittance.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 42(11), 7057-7061, 2003-11-15

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10012564686
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    6753009
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  J-STAGE  JSAP 
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