Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma

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著者

    • Li Zhuguo Li Zhuguo
    • Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

抄録

It is generally considered that an inductively coupled plasma (ICP) assisted magnetron sputtering allows independent control of the incident ion flux and its energy at the substrate. Some previous works, however, show that variation of the RF power induces changes in both the ion flux and its energy if an internal metallic coil antenna is used. In this study, we have applied an internal coil antenna with dielectric insulation, and plasma properties as well as ion energy distribution have been investigated by varying the RF power and the sputtering current. The incident ion flux was enhanced significantly by the addition of an ICP and exhibited a relatively narrow energy spread. Ion energy at the grounded substrate was found to be determined by the plasma potential and did not change markedly while increasing the RF power. These results enable us to independently adjust the incident ion flux and its energy by varying the RF power and the bias voltage to the substrate, respectively.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 42(11), 7086-7090, 2003-11-15

    公益社団法人 応用物理学会

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各種コード

  • NII論文ID(NAID)
    10012564775
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    6753101
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  J-STAGE  JSAP 
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