Relationship between the Photocatalytic Characteristics and the Oxygen Partial Pressure of TiO_2 Thin Films Prepared by a DC Reactive Sputtering Method

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Author(s)

Journal

  • Japanese Journal of Applied Physics Pt. 1 Regular Papers, Short Notes & Review Papers

    Japanese Journal of Applied Physics Pt. 1 Regular Papers, Short Notes & Review Papers 43(4), 1581-1585, 2004-04-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

References:  17

Codes

  • NII Article ID (NAID)
    10012860320
  • NII NACSIS-CAT ID (NCID)
    AA10457675
  • Text Lang
    ENG
  • Article Type
    ART
  • Journal Type
    大学紀要
  • ISSN
    00214922
  • NDL Article ID
    6931864
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z53-A375
  • Data Source
    CJP  NDL 
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