XPSスペクトル変化に現れるイオン照射による金属酸化物の損傷 Damage of Metallic Oxides Appeared in XPS Spectral Change after Ion Bombardment

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XPS or AES sputter depth profiling sometimes encounters difficulties with the materials that are damaged by ion bombardment. Therefore, it becomes difficult to determine precise chemical states of such materials. The damages of oxides by ion bombardment as observed in XPS spectra were reviewed. Spectrum changes are classified into three types; (1) additional peaks appear as a result of reduction for one type of the oxides, (2) the spectra are broadened for the second one, and (3) the third type oxides are not chemically changed. It is pointed out that these changes are related to the change of the enthalpy of atomization and ionicity. Secondly, the intensity changes as a function of sputtering time is formulated using reduction cross sections by the ion bombardment and sputtering yield.

収録刊行物

  • 表面科学 = Journal of The Surface Science Society of Japan

    表面科学 = Journal of The Surface Science Society of Japan 25(4), 198-204, 2004-04-10

    The Surface Science Society of Japan

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各種コード

  • NII論文ID(NAID)
    10012860626
  • NII書誌ID(NCID)
    AN00334149
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03885321
  • NDL 記事登録ID
    6919658
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z15-379
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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