Preparation of Bi-based Superconducting Thin Films by RF Magnetron Sputtering under Magnetic Field

• FUJIWARA Naoki

  Department of Electrical and Electric Engineering, Tottori University

• ONISHI Takahiro

  Department of Electrical and Electric Engineering, Tottori University

• KATSURAHARA Kouji

  Department of Electrical and Electric Engineering, Tottori University

• KISHIDA Satoru

  Department of Electrical and Electric Engineering, Tottori University

Bibliographic Information

Other Title

• 磁場印加型高周波マグネトロンスパッタ法によるＢｉ系超伝導薄膜の作製
• ジバ インカガタ コウシュウハ マグネトロンスパッタホウ ニ ヨル Biケイ チョウデンドウ ハクマク ノ サクセイ

Abstract

Crystallizations under magnetic field have being flourished. Using rf magnetron sputtering method under high magnetic field we formed Bi₂Sr₂Ca_n-1Cu_nO_y (Bi-based) superconducting thin films. Some of the deposited films showed zero resistance. Oxidization of films may be accelerated by applying magnetic field.

Journal

• Shinku

  Shinku 47 (3), 194-196, 2004

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390282679039930752
• NII Article ID: 10012867132
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.47.194
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 6930017
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6930017
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed