円環配置型スパッタイオンポンプの開発 Development of the Annular Sputter Ion Pump and its Pumping Characteristics
A sputter ion pump with the pumping cells assembled in an annular configuration is developed. The pump is characterized by following factors; 1) minimized residual magnetic field intensity at the center of annular configuration about 80 A/m, 2) high effective pumping speed larger than 0.03 m<SUP>3</SUP>/s and 3) low ultimate pressure about 4 × 10<SUP>-9</SUP> Pa. The design is suited for pumping the electron beam equipment such as scanning electron microscope, etc.
- 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN
真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 47(3), 255-257, 2004-03-20
The Vacuum Society of Japan