UHV-Compatible Apparatus for the High-Density Plasma Induced by Surface Wave Modes

• BANNO Tatsuya

  Department of Applied Physics, University of Tokyo

Bibliographic Information

Other Title

• 超高真空仕様表面波励起高密度プラズマ発生装置の評価
• チョウコウシンクウ シヨウ ヒョウメンハレイキコウミツド プラズマ ハッセイ ソウチ ノ ヒョウカ

Abstract

A microwave launcher with a ring slot has been designed, allowing a UHV viewing port to be utilized as a dielectric material in order to induce high-density plasma with the surface wave mode in a UHV compatible chamber. Electrostatic probe measurements on the plasma show that the plasma density distribution results from an intensive ionization rate in the vicinity of the dielectric/plasma interface and from the ambipolar diffusion. When nitrogen is mixed to argon gas, the plasma density remains almost constant as a result of the descrete surface mode, whereas the atomic nitrogen density varies in proportion to the nitrogen partial pressure.

Journal

• Shinku

  Shinku 47 (3), 281-284, 2004

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390001204063290112
• NII Article ID: 10012867329
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.47.281
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 6930222
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6930222
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed