Interfacial reactions in Ti/Si_<1-x>Ge_x/Si(100) studied by TEM and ADF imaging in a newly installed 200 kV TEM/STEM

• TANAKA N

収録刊行物

• Inst. Phys. Conf. Ser.

  Inst. Phys. Conf. Ser. 168 373-376, 2001

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• CRID: 1573105974935156096
• NII論文ID: 10012932555
• データソース種別:
  • CiNii Articles