大面積 Catalytic Chemical Vapor Deposition 装置の開発 Development of Catalytic Chemical Vapor Deposition Apparatus for Large Size Substrates

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Catalytic chemical vapor deposition (Cat-CVD) is a unique low temperature coating method without using plasma to obtain hydrogenated amorphous silicon (a-Si : H) and silicon nitride (SiNx) films. Using the Cat-CVD, it seems comparatively easy to obtain film thickness uniformity by arranging catalyzer's location in large area. And high efficiency of gas decomposition is also advantageous for large area coating. Large sized CVD equipment is required for some applications, such as solar cell and flat panel display, and the Cat-CVD is considered promising methods for the applications.<BR>We developed a vertical Cat-CVD system with both side depositions for large size substrates of 1.5 m wide. In such both side system, most important point is how to introduce source gases to the catalyzers located in large area for uniform deposition. It is confirmed uniform coating could be achieved at lower pressure and lower setting density of catalyzers.

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  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 47(5), 392-395, 2004-05-20

    一般社団法人 日本真空学会

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各種コード

  • NII論文ID(NAID)
    10013043228
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    6969220
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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