Ti-Al, Graded Al/AlTi, and Ti-Al-N Coatings Prepared by Supersonic Free-Jet PVD

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Author(s)

Abstract

The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N<SUB>2</SUB> in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces <i>in-situ</i> syntheses of γ-TiAl and α<SUB>2</SUB>-Ti<SUB>3</SUB>Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti<SUB>3</SUB>Al<SUB>2</SUB>N<SUB>2</SUB>, Ti<SUB>3</SUB>AlN, and AlN.

Journal

  • MATERIALS TRANSACTIONS

    MATERIALS TRANSACTIONS 45(5), 1620-1623, 2004-05-20

    The Japan Institute of Metals and Materials

References:  31

Cited by:  2

Codes

  • NII Article ID (NAID)
    10013071576
  • NII NACSIS-CAT ID (NCID)
    AA1151294X
  • Text Lang
    ENG
  • Article Type
    Journal Article
  • ISSN
    13459678
  • NDL Article ID
    6951453
  • NDL Source Classification
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL Call No.
    Z53-J286
  • Data Source
    CJP  CJPref  NDL  J-STAGE 
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