Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices

• Nakano Atsuro

  The Institute of Scientific and Industrial Research, Osaka University

• Okamoto Kazumasa

  The Institute of Scientific and Industrial Research, Osaka University

• Kozawa Takahiro

  The Institute of Scientific and Industrial Research, Osaka University

• Tagawa Seiichi

  The Institute of Scientific and Industrial Research, Osaka University

Abstract

The control of acid generation and diffusion is essential for the improvement of resist performance based on the chemical amplification concept. Polymethacrylates are excellent matrices to study resist reaction mechanisms. The dependence of polymer structure on acid generation and diffusion was investigated using polymethacrylate matrices. The ester groups of the polymers strongly affect the yield and diffusion of protons. This suggests that the yield and the diffusion constant of the acid can be controlled in chemically amplified resists based on a polymethacrylate copolymer by changing the composite ratio of the units.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 43 (6B), 3981-3983, 2004

  The Japan Society of Applied Physics

Keywords

• polymethacrylate
• line edge roughness
• resist sensitivity
• spatial resolution
• lithography
• proton diffusion

Details

• CRID: 1390282681240296576
• NII Article ID: 10013276420
• NII Article ID: 130004532225
• NII Article ID: 210000055824
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.43.3981
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/00214922
• NDL BIB ID: 6996805
• Web Site: http://id.ndl.go.jp/bib/6996805
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6996805
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.43.3981
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.43.3981/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed