Structure and Magnetic Properties of Iron Nitride Films Prepared by Reactive dc Magnetron Sputtering

  • Naganuma Hiroshi
    Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University
  • Nakatani Ryoichi
    Frontier Research Center, Graduate School of Engineering, Osaka University Science and Technology Center for Atoms, Molecules and Ions Control, Graduate School of Engineering, Osaka University
  • Endo Yasushi
    Frontier Research Center, Graduate School of Engineering, Osaka University
  • Kawamura Yoshio
    Department of Materials Science and Engineering, Graduate School of Engineering, Osaka University
  • Yamamoto Masahiko
    Frontier Research Center, Graduate School of Engineering, Osaka University

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We have investigated the structure and magnetic properties of iron nitride films prepared by reactive dc magnetron sputtering with an argon gas flow rate of 12 sccm and a nitrogen gas flow rate varied between 0–10 sccm. Under the above conditions, the nitrogen concentrations in the iron nitride films were changed from 0 to 33 at.%. The phase and structure of the films changed from α-Fe, amorphous matrix with nanocrystallites of ε-Fe3N, ε-FexN (2<x≤3) to ζ-Fe2N phase as the nitrogen concentration of the iron nitride films increases, and these changes in the phase almost correspond to the Fe–N phase diagram. The saturation magnetization of the iron nitride films decreases as the nitrogen concentration increases up to 31 at.%, and disappears at 33 at.%. A relatively low coercivity of 9 Oe is observed at the nitrogen concentrations from 11 to 18 at.%. From the results of structural analysis and magnetic measurements, it is confirmed that the coercivity of the iron nitride films mostly correlates with the changes in grain size.

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