塩酸溶液中の三角波交流エッチングによる高純度アルミニウム箔の拡面化におよぼすアノード電流波形の影響 Effect of Anodic Half Cycle on Surface Area of High Purity Aluminum Foil in Hydrochloric Acid Solution under Triangular AC Etching

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The ac etching process on high purity aluminum foil used in electrodes for electrolytic capacitors was investigated in 3.6wt% hydrochloric acid solution at 303K and 323K by applying an asymmetrical triangular current of 0.3A/cm<sup>2</sup> with 5Hz. The time at the top of the current form of the anodic half cycle, t<sub>p</sub>, was varied in the range of 0 to 0.1s. Etching products developed on the etching cell during the process were characterized by SEM, XPS and gravimetric analysis. The etched layer contained the products of a duplex structure, consisting of an inner anodic film of Al<sub>2</sub>O<sub>3</sub> and an outer hydrous oxide layer of Al<sub>2</sub>O<sub>3</sub><B>·</B>1.6H<sub>2</sub>O, which was formed at all t<sub>p</sub> at 303K and the t<sub>p</sub> range of 0.075~0.1s at 323K, while no etched layer was observed at t<sub>p</sub> ≤0.05s at 323K, except for only a thin film of Al<sub>2</sub>O<sub>3</sub>. It seems to be that the variation of t<sub>p</sub> affects the concentration gradient of chloride ions in the vicinity of the aluminum electrode and results in the change of the specific surface area of aluminum, and t<sub>p</sub> also affects the concentration of the aluminum hydroxide deposited on the electrode during the cathodic half cycle.<br>

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 55(7), 489-494, 2004-07-01

    The Surface Finishing Society of Japan

参考文献:  11件中 1-11件 を表示

  • <no title>

    菅沼栄一

    表面技術 41, 1049, 1990

    被引用文献9件

  • <no title>

    THOMPSON G. E.

    Corros. Sci. 18, 721, 1978

    被引用文献8件

  • <no title>

    DYER C. K.

    J. Electrochem. Soc. 128, 300, 1981

    被引用文献10件

  • <no title>

    菅沼栄一

    表面技術 52, 625, 2001

    被引用文献3件

  • <no title>

    日本表面科学会編

    X線光電子分光法 143, 2000

    被引用文献1件

  • <no title>

    菅沼栄一

    表面技術 51, 929, 2000

    被引用文献3件

  • <no title>

    RICHARDSON J. A.

    Corros. Sci. 10, 313, 1970

    被引用文献3件

  • <no title>

    松木健三

    金属表面技術 38, 246, 1987

    被引用文献5件

  • <no title>

    菅沼栄一

    表面技術 42, 928, 1991

    被引用文献5件

  • <no title>

    OSAWA N.

    Corros. Sci. 42, 585, 2000

    被引用文献2件

  • <no title>

    FLIS J.

    J. Appl. Electrochem. 25, 501, 1995

    被引用文献2件

被引用文献:  1件中 1-1件 を表示

各種コード

  • NII論文ID(NAID)
    10013342211
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    7052491
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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